The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2013
Filed:
Nov. 23, 2010
Hylke Veenstra, Reuver, NL;
Hylke Veenstra, Reuver, NL;
Ocë Technologies B.V, Venlo, NL;
Mutracx, Helmond, NL;
Abstract
A method for adjusting a recording substrate and at least one array relative to each other, the array being part of a printing device having a carrying structure for mounting the array. The array has nozzles arranged in a row substantially parallel to a direction for forming second test marks on a recording substrate, the substrate being pre-printed with first test marks. The array and the recording substrate are in an attainable relative position. The method comprises forming a test pattern having the first and second test marks and detecting the locations of the first and second test marks; determining a plurality of deviation factors for a plurality of attainable relative positions based on said detected locations, wherein each one of said deviation factors is an attribute of a distinct attainable relative position and is indicative of an amount by which distances between neighboring first and second marks deviate from a nominal distance; and selecting an attainable relative position among the plurality of attainable relative positions which satisfies a selection criterion applied to the plurality of deviation factors.