The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 18, 2013

Filed:

May. 26, 2010
Applicants:

Ashok Kumar Mishra, Singapore, SG;

Subramanian Vaidyanathan, Singapore, SG;

Hiroyoshi Noguchi, Singapore, SG;

Florian Doetz, Singapore, SG;

Silke Annika Koehler, Basel, CH;

Marcel Kastler, Basel, CH;

Inventors:

Ashok Kumar Mishra, Singapore, SG;

Subramanian Vaidyanathan, Singapore, SG;

Hiroyoshi Noguchi, Singapore, SG;

Florian Doetz, Singapore, SG;

Silke Annika Koehler, Basel, CH;

Marcel Kastler, Basel, CH;

Assignees:

BASF SE, Ludwigshafen, DE;

Polyera Corporation, Skokie, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/00 (2006.01); H01L 29/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A polymer comprising repeating units A and optionally repeating units B wherein Z=S, Se, N—R and O; W is at each occurrence independently a monocyclic or polycylic moiety optionally substituted with 1-4 Rgroups; Y, at each occurrence, is independently a divalent Calkyl group, a divalent Chaloalkyl group, or a covalent bond; c is from 1 to 6.


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