The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2013
Filed:
Jun. 12, 2012
Applicants:
Marion Jurk, Dormagen, DE;
Jorg Vollmer, Dusseldorf, DE;
Inventors:
Marion Jurk, Dormagen, DE;
Jorg Vollmer, Dusseldorf, DE;
Assignee:
Coley Pharmaceutical GmbH, Dusseldorf, DE;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
A61K 48/00 (2006.01); C12Q 1/68 (2006.01); C07H 21/02 (2006.01); C12N 5/02 (2006.01); C12N 5/00 (2006.01); C07H 21/04 (2006.01);
U.S. Cl.
CPC ...
Abstract
Immunostimulatory polymers that contain certain sequence-dependent immunostimulatory RNA motifs and methods for the use of such immunostimulatory polymers and compositions containing such polymers are provided according to the invention. The sequence-dependent immunostimulatory RNA motifs and the polymers incorporating such motifs are potent and selective inducers of TLR7 and the TLR7-associated cytokine IFN-α.
Jurk, Marion. (2013). Rna sequence motifs in the context of defined internucleotide linkages inducing specific immune modulatory profiles (U.S. Patent No. 8466124). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8466124
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile