The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 18, 2013

Filed:

Nov. 21, 2011
Applicants:

Young-ki Jung, Gyeonggi-do, KR;

Seok-woo Lee, Gyeonggi-do, KR;

Kum-mi OH, Seoul, KR;

Dong-cheon Shin, Gyeonggi-do, KR;

In-hyuk Song, Gyeonggi-do, KR;

Han-seok Lee, Seoul, KR;

Won-keun Park, Seoul, KR;

Inventors:

Young-Ki Jung, Gyeonggi-do, KR;

Seok-Woo Lee, Gyeonggi-do, KR;

Kum-Mi Oh, Seoul, KR;

Dong-Cheon Shin, Gyeonggi-do, KR;

In-Hyuk Song, Gyeonggi-do, KR;

Han-Seok Lee, Seoul, KR;

Won-Keun Park, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/84 (2006.01); G02F 1/1337 (2006.01); G02F 1/1343 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of manufacturing an array substrate for a fringe field switching mode liquid crystal display includes: forming an auxiliary insulating layer having a first thickness; forming first and second photoresist patterns on the auxiliary insulating layer; performing an ashing to remove the second photoresist pattern and expose the auxiliary insulating layer therebelow; performing a dry etching to remove the auxiliary insulating layer not covered by the first photoresist pattern and expose a first passivation layer and to form an insulating pattern below the first photoresist pattern, the insulating pattern and the first photoresist pattern forming an undercut shape; forming a transparent conductive material layer having a fourth thickness less than the first thickness; and performing a lift-off process to remove the first photoresist pattern and the transparent conductive material layer thereon together and form a pixel electrode.


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