The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 18, 2013

Filed:

May. 24, 2010
Applicants:

Mark A. Hackler, Ocean, NJ (US);

David Anthony Belfiore, Landenberg, PA (US);

Dietmar Dudek, Langen, DE;

Anandkumar R. Kannurpatti, Glen Mills, PA (US);

Andreas Koch, Wiesbaden, DE;

Inventors:

Mark A. Hackler, Ocean, NJ (US);

David Anthony Belfiore, Landenberg, PA (US);

Dietmar Dudek, Langen, DE;

Anandkumar R. Kannurpatti, Glen Mills, PA (US);

Andreas Koch, Wiesbaden, DE;

Assignee:

E I du Pont de Nemours and Company, Wilmington, DE (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/34 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention is a method and apparatus for forming a relief structure by thermally developing a photosensitive element containing a composition layer capable of being partially liquefied. During thermal development, the photosensitive element is supported on a base member having an exterior surface that is textured. The textures for the exterior surface include a particular surface roughness and/or patterns.


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