The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 11, 2013

Filed:

Jan. 11, 2012
Applicant:

Hironobu Taoka, Kanagawa, JP;

Inventor:

Hironobu Taoka, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a lithography verification apparatus which executes high-precision lithography verification in consideration of the effects of individual errors integrated. Various information (simulation result, error standard, etc.) are input. A variation distribution value is calculated. The variation distribution value and a variation distribution error standard are compared to determine whether the variation distribution value is smaller than the error standard. The variation distribution error standard is a standard for a value or the like related to a standard deviation or the like for a dimensional displacement. When it is determined that the variation distribution value is smaller than the error standard, an error is determined not to exist, and the processing is ended. When it is determined that the variation distribution value is not smaller than the error standard, an error is determined to exist, and an error list and a variation distribution value are outputted.


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