The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2013
Filed:
Mar. 31, 2011
Wolfgang Klein, Zorneding, DE;
Uwe Seidel, Munich, DE;
Stefan Barzen, Munich, DE;
Mohsin Nawaz, Unterhaching, DE;
Wolfgang Friza, Villach, AT;
Xu Cheng, Munich, DE;
Alfons Dehe, Reutlingen, DE;
Wolfgang Klein, Zorneding, DE;
Uwe Seidel, Munich, DE;
Stefan Barzen, Munich, DE;
Mohsin Nawaz, Unterhaching, DE;
Wolfgang Friza, Villach, AT;
Xu Cheng, Munich, DE;
Alfons Dehe, Reutlingen, DE;
Infineon Technologies AG, Neubiberg, DE;
Abstract
A method for manufacturing a micromechanical sound transducer includes depositing successive layers of first and second membrane support material on a first main surface of a substrate arrangement with a first etching rate and a lower second etching rate, respectively. A layer of membrane material is then deposited. A cavity is created in the substrate arrangement from a side of the substrate arrangement opposite to the membrane support materials and the membrane material at least until the cavity extends to the layer of first membrane support material. The layers of first and second membrane support material are etched by applying an etching agent through the cavity in at least one first region located in an extension of the cavity also in a second region surrounding the first region. The etching creates a tapered surface on the layer of second membrane support material in the second region. The etching continues at least until the layer of second membrane support material has been removed in the first region to expose the layer of membrane material.