The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2013
Filed:
Dec. 20, 2011
Masanori Sakai, Takaoka, JP;
Yuji Takebayashi, Toyama, JP;
Tsutomu Kato, Takaoka, JP;
Shinya Sasaki, Toyama, JP;
Hirohisa Yamazaki, Toyama, JP;
Masanori Sakai, Takaoka, JP;
Yuji Takebayashi, Toyama, JP;
Tsutomu Kato, Takaoka, JP;
Shinya Sasaki, Toyama, JP;
Hirohisa Yamazaki, Toyama, JP;
Hitachi Kokusai Electric Inc., Tokyo, JP;
Abstract
The substrate processing apparatus includes: a processing chamber for storing and processing substrates stacked in multiple stages in horizontal posture; at least one processing gas supply nozzle which extends running along an inner wall of the processing chamber in the stacking direction of the substrates and supplies a processing gas to the inside of the processing chamber; a pair of inactive gas supply nozzles which are provided so as to extend running along the inner wall of the processing chamber in the stacking direction of the substrates and so as to sandwich the processing gas supply nozzle from both sides thereof along the circumferential direction of the substrates and which supply the inactive gas to the inside of the processing chamber; and an exhaust line for exhausting the inside of the processing chamber.