The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 11, 2013

Filed:

Feb. 24, 2011
Applicant:

Hsi-ming Chang, Taoyuan County, TW;

Inventor:

Hsi-Ming Chang, Taoyuan County, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
Abstract

A fabrication method of a minute pattern at least includes following steps. A first crystallizable material layer is formed on a base material. The first crystallizable material layer is patterned to form a plurality of first patterns on the base material. A distance between every two adjacent first patterns is greater than a width of each of the first patterns. A first treatment process is performed to crystallize the first patterns. A second crystallizable material layer is formed on the base material and covers the first patterns. The second crystallizable material layer is patterned to form a plurality of second patterns on the base material. Each of the second patterns is located between the first patterns adjacent thereto, respectively.


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