The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2013
Filed:
Oct. 06, 2009
Nicolas Blasco, Grenoble, FR;
Anthony Correia-anacleto, Maisons-Alfort, FR;
Audrey Pinchart, Antony, FR;
Andreas Zauner, Voisins le Bretonneux, FR;
Nicolas Blasco, Grenoble, FR;
Anthony Correia-Anacleto, Maisons-Alfort, FR;
Audrey Pinchart, Antony, FR;
Andreas Zauner, Voisins le Bretonneux, FR;
Abstract
Disclosed are methods for forming a metal-containing layer on a substrate. A vapor comprising at least one precursor compound selected from the group consisting of (Cp)V(=NtBu)(NEt); (Cp)V(=NtBu)(NMe); (Cp)V(=NtBu)(NEtMe); (Cp)V(═NiPr)(NEt); (Cp)V(═NiPr)(NMe); (Cp)V(═NiPr)(NEtMe); (Cp)V(═NCH)(NEt); (Cp)V(═NCH)(NMe); (Cp)V(═NCH)(NEtMe); (Cp)Nb(=NtBu)(NEt); (Cp)Nb(=NtBu)(NMe); (Cp)Nb(=NtBu)(NEtMe); (Cp)Nb(═NiPr)(NEt); (Cp)Nb(═NiPr)(NMe); (Cp)Nb(═NiPr)(NEtMe); (Cp)Nb(═NCH)(NEt); (Cp)Nb(═NCH)(NMe); and (Cp)Nb(═NCH)(NEtMe)is provided. At least one reaction gas selected from the group consisting of ozone and water is provided. The vapor and the reaction gas react with the substrate according to a deposition process to form the metal-containing layer on at least one surface of the substrate.