The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 11, 2013

Filed:

Apr. 07, 2011
Applicants:

Shinichiro Tanaka, Tottori, JP;

Masakatsu Higa, Tottori, JP;

Shuhei Yoshida, Tottori, JP;

Inventors:

Shinichiro Tanaka, Tottori, JP;

Masakatsu Higa, Tottori, JP;

Shuhei Yoshida, Tottori, JP;

Assignee:

Japan Display West Inc., Aichi-Ken, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 33/58 (2010.01);
U.S. Cl.
CPC ...
Abstract

A manufacturing method for a liquid crystal apparatus of a transverse electric field system that is provided with a liquid crystal layer sandwiched between a first substrate and a second substrate and a pixel electrode and a common electrode formed on the first substrate and is arranged to drive liquid crystal through an electric field generated between the pixel electrode and the common electrode includes the steps of forming a material layer made of photosensitive resin on a glass substrate and performing an exposure processing with a predetermined exposure pattern, performing a development processing on the material layer and forming a resin light interruption layer having an opening section that exposes the glass substrate in a bottom section, forming an electrostatic interruption layer while covering the resin light interruption layer, and providing a colored layer in an area overlapped with the opening section on the electrostatic interruption layer.


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