The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2013
Filed:
Jul. 07, 2011
Koji Otsuka, Tokyo, JP;
Kenji Okamura, Tokyo, JP;
Koji Otsuka, Tokyo, JP;
Kenji Okamura, Tokyo, JP;
Asahi Glass Company, Limited, Tokyo, JP;
Abstract
A glass substrate obtained by a method including measuring flatness of a glass substrate surface and measuring concentration distribution of dopant in the substrate. Processing conditions of the surface are set up for each site of the substrate based on results from the measuring the flatness and the measuring the distribution, and the finishing is carried out while keeping an angle formed by normal line of the substrate and incident beam onto the surface at from 30 to 89°. The surface is subjected to second finishing for improving an RMS in a high spatial frequency region. The surface after the second finishing satisfies the requirements: an RMS slope in the region that 5 μm<λ (spatial wavelength)<1 mm is not more than 0.5 mRad and an RMS slope in the region that 250 nm<λ (spatial wavelength)<5 μm is not more than 0.6 mRad.