The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2013
Filed:
Nov. 15, 2007
Ilsoon Lee, Okemos, MI (US);
Troy R. Hendricks, Knoxville, TN (US);
Ilsoon Lee, Okemos, MI (US);
Troy R. Hendricks, Knoxville, TN (US);
Board of Trustees of Michigan State University, East Lansing, MI (US);
Abstract
Methods to control and prevent polymer films from buckling are provided. Buckled morphologies are created by thermally cycling or mechanically compressing a substrate such as poly(dimethylsiloxane) (PDMS) coated with a polyelectrolyte multilayer film. By varying the dimensions of the surface topography relative to the buckling wavelength (e.g., pattern size is less than, equal to, and greater than the buckling wavelength) the orientation and the local morphology of the buckled films is controlled. Based on the information obtained, we demonstrate how to alleviate the unavoidable buckling by incorporating nanoparticles into the film. In addition, we studied the effect of the silica layer that results from oxygen plasma treatment and the critical temperature for permanent film buckling.