The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2013
Filed:
Apr. 27, 2010
Kim Y Lee, Fremont, CA (US);
Hong Ying Wang, Fremont, CA (US);
Nobuo Kurataka, Campbell, CA (US);
Christopher Formato, Brentwood, CA (US);
David S Kuo, Palo Alto, CA (US);
Dieter K Weller, San Jose, CA (US);
Kim Y Lee, Fremont, CA (US);
Hong Ying Wang, Fremont, CA (US);
Nobuo Kurataka, Campbell, CA (US);
Christopher Formato, Brentwood, CA (US);
David S Kuo, Palo Alto, CA (US);
Dieter K Weller, San Jose, CA (US);
Seagate Technology LLC, Cupertino, CA (US);
Abstract
A method of fabricating a patterned magnetic recording medium, comprises steps of: (a) providing a layer stack including an uppermost non-magnetic interlayer; (b) forming a resist layer on the interlayer; (c) forming a first pattern comprising a first group of recesses extending through the resist layer and exposing a first group of spaced apart surface portions of the interlayer; (d) filling the first group of recesses with a layer of a hard mask material; (e) selectively removing the resist layer to form a second pattern comprising a second group of recesses extending through the hard mask layer and exposing a second group of spaced apart surface portions of the interlayer; and (f) filling the second group of recesses with a layer of a magnetically hard material forming a magnetic recording layer.