The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2013
Filed:
Oct. 30, 2009
Masakazu Minami, Cupertino, CA (US);
Daisuke Hayashi, Otsu, JP;
Yuhei Sakaguchi, Osaka, JP;
Katsumi Nishimura, Kyoto, JP;
Masaki Inoue, Cupertino, CA (US);
Kotaro Takijiri, Santa Clara, CA (US);
Masakazu Minami, Cupertino, CA (US);
Daisuke Hayashi, Otsu, JP;
Yuhei Sakaguchi, Osaka, JP;
Katsumi Nishimura, Kyoto, JP;
Masaki Inoue, Cupertino, CA (US);
Kotaro Takijiri, Santa Clara, CA (US);
Horiba, Ltd., Kyoto-shi, JP;
Horiba Stec, Co., Ltd., Kyoto-shi, JP;
Abstract
A material gas concentration control system for keeping a concentration of a material gas in a mixed gas constant comprising a tank to accommodate the material, an inlet line to input a carrier gas for evaporating the accommodated material into the tank, and an outlet line to output the mixed gas consisting of the material gas evaporated in the tank and the carrier gas, and further comprising a first valve arranged in the inlet line, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a concentration control part that controls an open degree of the first valve so as to make the measured concentration of the material gas measured by the concentration measuring part become the previously determined set concentration.