The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2013
Filed:
Jan. 20, 2012
Jaione Tirapu-azpiroz, Rio de Janeiro, BR;
Ramya Viswanathan, Bangalore, IN;
Jaione Tirapu-Azpiroz, Rio de Janeiro, BR;
Ramya Viswanathan, Bangalore, IN;
International Business Machines Corporation, Armonk, NY (US);
Abstract
Printing risks for sub-lithographic assist features (SRAFs) can be predicted and minimized by employing an SRAF printing model, which is calibrated at a different image plane than an image plane at which a main feature model for predicting shapes of printed images of main features is calibrated. The optical model parameters of the main feature model and the SRAF printing model are calibrated separately such that the main feature model predicts the bottom CD and the SRAF printing model predicts the printing of SRAF features in a photoresist. Optionally, different degrees of printing risk can be assigned for different SRAF configurations.