The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2013
Filed:
Sep. 09, 2009
Amit Lal, Ithaca, NY (US);
Norimasa Yoshimizu, Ithaca, NY (US);
Amit Lal, Ithaca, NY (US);
Norimasa Yoshimizu, Ithaca, NY (US);
Cornell University, Ithaca, NY (US);
Abstract
A wafer-scale nano-metrology system () for sensing position of a nanofabrication element () when illuminated by a patterned optical projection defining a grid or position measuring gauge includes a frequency stabilized laser emitter () configured to generate a laser emission at a selected frequency, where the laser emission forms a diverging beam configured to illuminate a selected area occupied by a target fabrication object () having a proximal surface. An optical pattern generator () is illuminated by laser () and generates a patterned optical projection grid or gauge for projection upon the target fabrication object (). A movable tool or nanofabrication element () carries an optical sensor array (), and the sensor array detect at least a portion of the optical projection grid, and, in response to that detection, generates grid position data for use in controlling the position of the tool ().