The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2013
Filed:
Jul. 22, 2009
Applicant:
Kei Nara, Yokohama, JP;
Inventor:
Kei Nara, Yokohama, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/32 (2006.01); G03B 27/42 (2006.01); G03B 27/54 (2006.01); G03B 27/74 (2006.01);
U.S. Cl.
CPC ...
Abstract
An exposure device includes: a light source (LS) which emits a pulse light; and a variable shaped mask () which has a plurality of aligned micro movable mirrors and forms an arbitrary pattern by selectively changing the operation state of the movable mirrors. A substrate (P) is exposed to the light emitted from the light source and passes through the variable shaped mask. The exposure device further includes a control device () which controls the operation timing to change the operation state of the movable mirrors and the pulse application timing of the pulse light emitted from the light source so that they are synchronized.