The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2013
Filed:
Dec. 27, 2006
Applicants:
Daan Dewachter, Mechelen, BE;
Louis Fouarge, Dilbeek, BE;
Alain Brusselle, Wilrijk, BE;
Inventors:
Assignee:
Total Research & Technology Feluy, Seneffe (Feluy), BE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 2/00 (2006.01); C08F 4/44 (2006.01); C08F 4/72 (2006.01); F01N 3/20 (2006.01); B01J 19/00 (2006.01); B01J 19/18 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention discloses a slurry loop reactor comprising at least two loop reactors connected in series and wherein the line connecting the two loops is subject to a dynamic pressure difference.
Dewachter, Daan. (2013). Dynamic pressure control in double loop reactor (U.S. Patent No. 8455595). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8455595
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile