The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2013
Filed:
Oct. 29, 2010
Lisa H. Karlin, Chandler, AZ (US);
David W. Kierst, Austin, TX (US);
Lianjun Liu, Chandler, AZ (US);
Wei Liu, Chandler, AZ (US);
Ruben B. Montez, Cedar Park, TX (US);
Robert F. Steimle, Austin, TX (US);
Lisa H. Karlin, Chandler, AZ (US);
David W. Kierst, Austin, TX (US);
Lianjun Liu, Chandler, AZ (US);
Wei Liu, Chandler, AZ (US);
Ruben B. Montez, Cedar Park, TX (US);
Robert F. Steimle, Austin, TX (US);
Freescale Semiconductor, Inc., Austin, TX (US);
Abstract
A method of forming a MEMS device includes forming a sacrificial layer over a substrate. The method further includes forming a metal layer over the sacrificial layer and forming a protection layer overlying the metal layer. The method further includes etching the protection layer and the metal layer to form a structure having a remaining portion of the protection layer formed over a remaining portion of the metal layer. The method further includes etching the sacrificial layer to form a movable portion of the MEMS device, wherein the remaining portion of the protection layer protects the remaining portion of the metal layer during the etching of the sacrificial layer to form the movable portion of the MEMS device.