The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2013
Filed:
Nov. 23, 2011
Hyunjong Noh, Paju-si, KR;
Jinho Kim, Paju-si, KR;
Youngnam Lim, Seoul, KR;
Kyeongjin Kim, Goyang-si, KR;
Hyunjong Noh, Paju-si, KR;
Jinho Kim, Paju-si, KR;
Youngnam Lim, Seoul, KR;
Kyeongjin Kim, Goyang-si, KR;
LG Display Co., Ltd., Seoul, KR;
Abstract
The present disclosure relates to a method for manufacturing the patterned retarder used in the three-dimensional display device. The present disclosure suggests a method for manufacturing a patterned retarder comprising: defining a first retarder region and a second retarder region in the patterned retarder; forming a first polarization pattern at the first retarder region by a partial exposure process having a first exposure energy; and forming a second polarization pattern at the second retarder region by whole exposure process having a second exposure energy. By manufacturing the patterned retarder with lower exposure energy, it is possible to reduce the whole manufacturing takt time, so that the production yield can be enhanced and the production cost can be reduced.