The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2013
Filed:
Feb. 04, 2008
Kenji Hata, Ibaraki, JP;
Satoshi Yasuda, Ibaraki, JP;
Motoo Yumura, Ibaraki, JP;
Abstract
An apparatus (CVD apparatus ()) having a reaction chamber () for accommodating a substrate () formed with a metal catalyst film and means (gas supply pipes ()) for supplying a feedstock gas () and a catalyst activating material () into the reaction chamber () for manufacturing CNTs aligned in a direction perpendicular to the catalyst film surface () of the substrate (), wherein the means for supplying the feedstock gas () and the catalyst activating material () have a plurality of ejection holes placed at positions facing the catalyst film surface () of the substrate (), and the ejecting direction of the ejection holes is adjusted to the direction of alignment of CNTs grown from the metal catalyst film. This can provide a manufacturing technology for CNTs capable of mass-producing aligned CNTs at lower cost.