The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 28, 2013

Filed:

Aug. 10, 2010
Applicants:

Shi-shang Jang, Hsinchu, TW;

Tain-hong Pan, Jiangsu, CN;

Shan-hill Wong, Hsinchu, TW;

Inventors:

Shi-Shang Jang, Hsinchu, TW;

Tain-Hong Pan, Jiangsu, CN;

Shan-Hill Wong, Hsinchu, TW;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2011.01); G06F 7/60 (2006.01); G06F 17/50 (2006.01); G05B 19/418 (2006.01);
U.S. Cl.
CPC ...
G05B 19/41875 (2013.01); G06F 17/5018 (2013.01); G06F 17/5022 (2013.01);
Abstract

The invention discloses a process quality prediction system and a method thereof. When a processing apparatus performs a process on a target, the process is measured by a measurement apparatus to receive a process value. The process value and several previous quality data collected from the measurement apparatus are used to predict the quality of the product which is processing inline. The method is composed of a moving window, a stepwise regression scheme and an analysis of covariance (ANCOVA). The drift and shift of process are overcome by the moving window. A key variable set is selected by the stepwise regression scheme and a virtual model is identified by the analysis of covariance.


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