The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2013
Filed:
Mar. 31, 2010
Karen M. Taminger, Yorktown, VA (US);
Robert A. Hafley, Yorktown, VA (US);
Richard E. Martin, Yorktown, VA (US);
William H. Hofmeister, Nashville, TN (US);
Karen M. Taminger, Yorktown, VA (US);
Robert A. Hafley, Yorktown, VA (US);
Richard E. Martin, Yorktown, VA (US);
William H. Hofmeister, Nashville, TN (US);
Abstract
A closed-loop control method for an electron beam freeform fabrication (EBF) process includes detecting a feature of interest during the process using a sensor(s), continuously evaluating the feature of interest to determine, in real time, a change occurring therein, and automatically modifying control parameters to control the EBFprocess. An apparatus provides closed-loop control method of the process, and includes an electron gun for generating an electron beam, a wire feeder for feeding a wire toward a substrate, wherein the wire is melted and progressively deposited in layers onto the substrate, a sensor(s), and a host machine. The sensor(s) measure the feature of interest during the process, and the host machine continuously evaluates the feature of interest to determine, in real time, a change occurring therein. The host machine automatically modifies control parameters to the EBFapparatus to control the EBFprocess in a closed-loop manner.