The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2013
Filed:
Apr. 21, 2010
Adrian Podoleanu, Canterbury, GB;
Simon Tuohy, Oxford, GB;
Adrian Podoleanu, Canterbury, GB;
Simon Tuohy, Oxford, GB;
Other;
Abstract
Methods and devices are disclosed for acquiring depth resolved aberration information using principles of low coherence interferometry and perform coherence gated wavefront sensing (CG-WFS). The wavefront aberrations is collected using spectral domain low coherence interferometry (SD-LCI) or time domain low coherence interferometry (TD-LCI) principles. When using SD-LCI, chromatic aberrations can also be evaluated. Methods and devices are disclosed in using a wavefront corrector to compensate for the aberration information provided by CG-WFS, in a combined imaging system, that can use one or more channels from the class of (i) optical coherence tomography (OCT), (ii) scanning laser ophthalmoscopy, (iii) microscopy, such as confocal or phase microscopy, (iv) multiphoton microscopy, such as harmonic generation and multiphoton absorption. For some implementations, simultaneous and dynamic aberration measurements/correction with the imaging process is achieved. The methods and devices disclosed can provide wavefront sensing in the presence of stray reflections from optical interfaces.