The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 28, 2013

Filed:

Jan. 20, 2012
Applicants:

Hye-seok NA, Seoul, KR;

Byoung-sun NA, Hwaseong-si, KR;

Won-hee Lee, Seoul, KR;

Ho-kyoon Kwon, Seoul, KR;

Ji-hyun Kwon, Asan-si, KR;

Inventors:

Hye-Seok Na, Seoul, KR;

Byoung-Sun Na, Hwaseong-si, KR;

Won-Hee Lee, Seoul, KR;

Ho-Kyoon Kwon, Seoul, KR;

Ji-Hyun Kwon, Asan-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1343 (2006.01);
U.S. Cl.
CPC ...
Abstract

A first slit pattern is formed in a display substrate and a display panel of vertical alignment mode having the display substrate. The first slit pattern includes slits, a pair of projections and a pair of notches. A divergence point where the slits meet each other and an incision portion of the slits have the same function as the pair of projections in the generation of a singular point of liquid crystal. A contact hole exposing a part of an output electrode of a switching element is formed at a protective layer of an array substrate. A step recess is formed at a protective layer corresponding to a storage electrode, a divergence point of the slits is arranged to correspond to the storage electrode. The singular point of the liquid crystal is induced to occur at a regular position, and thus afterimages and spots can be prevented.


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