The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 28, 2013

Filed:

Sep. 12, 2011
Applicants:

Peter J. Hopper, San Jose, CA (US);

William French, San Jose, CA (US);

Andrei Papou, San Jose, CA (US);

Dok Won Lee, Mountain View, CA (US);

Inventors:

Peter J. Hopper, San Jose, CA (US);

William French, San Jose, CA (US);

Andrei Papou, San Jose, CA (US);

Dok Won Lee, Mountain View, CA (US);

Assignee:

National Semiconductor Corporation, Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/08 (2006.01); H01L 29/00 (2006.01); H01L 21/00 (2006.01); H01F 17/06 (2006.01); H01F 7/06 (2006.01); H01F 27/24 (2006.01); H01F 3/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A plurality of sequential electro-deposition, planarization and insulator deposition steps are performed over a patterned thick photoresist film to form a laminated ferromagnetic alloy core for micro-fabricated inductors and transformers. The use of a plurality of contiguous thin laminations within deep patterns on non-removable photoresist film provides sufficient volume of magnetic film in, for example, high frequency applications, and reduces eddy current loss at high frequency.


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