The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2013
Filed:
May. 17, 2011
Applicants:
Howard I. Heitner, Tuckahoe, NY (US);
Donald P. Spitzer, Stamford, CT (US);
Inventors:
Howard I. Heitner, Tuckahoe, NY (US);
Donald P. Spitzer, Stamford, CT (US);
Assignee:
Cytec Technology Corp., Wilmington, DE (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 73/04 (2006.01);
U.S. Cl.
CPC ...
Abstract
Hydrophobically modified Si-containing polyamines are useful for treating scale in industrial process streams. Preferred hydrophobically modified Si-containing polyamines are particularly useful for treating aluminosilicate scale in difficult-to-treat industrial process streams, such as in the Bayer alumina process streams, nuclear waste streams and kraft paper mill effluent streams.