The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2013
Filed:
Nov. 10, 2010
SE Eun Lee, Seoul, KR;
Dong JO Ryu, Daejeon, KR;
Seon Hee Han, Daejeon, KR;
Jeong Heon Ahn, Suncheon-si, KR;
Se Eun Lee, Seoul, KR;
Dong Jo Ryu, Daejeon, KR;
Seon Hee Han, Daejeon, KR;
Jeong Heon Ahn, Suncheon-si, KR;
LG Chem, Ltd., Seoul, KR;
Abstract
Disclosed is a resin having excellent impact resistance and color, and a method of preparing the same, and more specifically, a resin having the excellent impact resistance and color, and a method of preparing the same, in which the resin includes (a) an occlusion seed consisting of i) a base seed includingtowt % of alkyl methacrylate andtowt % of crosslinker, and ii) a copolymer of aromatic vinyl compound and alkyl acrylate occluding the base seed; (b) a polymer core surrounding the occlusion seed; and (c) a polymer shell surrounding the core, and according to the present invention, it is effective in providing a resin having superior impact strength, transparency, and color, in which the resin can be used as an excellent impact modifier when applying on a polymethylmethacrylate resin, and a method of preparing the same.