The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2013
Filed:
Jun. 30, 2011
Shinya Suzuki, Miyagi, JP;
Mitsunari Hoshi, Miyagi, JP;
Shinya Suzuki, Miyagi, JP;
Mitsunari Hoshi, Miyagi, JP;
Sony Corporation, Tokyo, JP;
Abstract
A method of manufacturing a retardation film includes: a first step of forming, on the same metal master, a main region having several kinds of groove regions having different extending directions of grooves, and a sub region having one kind of groove region having a predetermined extending direction of grooves or several kinds of groove regions having different extending directions of grooves; and a second step of collectively transferring reverse patterns of the main and sub regions on the metal master to a base, and then forming, on a surface of the base, a layer including an alignable material to be aligned in correspondence to irregularity of the surface of the base, thereby forming a patterned retardation region in a site having a reverse pattern of the main region, and forming an alignment mark region in a site having a reverse pattern of the sub region.