The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 28, 2013

Filed:

Sep. 01, 2010
Applicants:

Gary D. Cudak, Research Triangle Park, NC (US);

Christopher J. Hardee, Research Triangle Park, NC (US);

Randall C. Humes, Research Triangle Park, NC (US);

Heather C. Miller, Research Triangle Park, NC (US);

Inventors:

Gary D. Cudak, Research Triangle Park, NC (US);

Christopher J. Hardee, Research Triangle Park, NC (US);

Randall C. Humes, Research Triangle Park, NC (US);

Heather C. Miller, Research Triangle Park, NC (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 21/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus, method, and system for modifying application windows based on projection surface characteristics. One embodiment of the apparatus includes a determination module, an identification module, and a modification module. The determination module determines one or more characteristics of a projection surface including detrimental characteristics. The identification module identifies one or more application windows for displayed within the projected image. The one or more application windows correspond to one or more applications executing on a processor. One or more of the identified application windows are for projection on at least one location of one or more detrimental characteristics. The modification module modifies one or more of a size, a shape, and a position of at least a portion of the one or more identified application windows to avoid the at least one location of the one or more detrimental characteristics.


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