The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 2013

Filed:

Aug. 27, 2009
Applicants:

Wolfgang Gerhard Rehwald, Chapel Hill, NC (US);

Enn-ling Chen, Chapel Hill, NC (US);

Raymond J. Kim, Chapel Hill, NC (US);

Inventors:

Wolfgang Gerhard Rehwald, Chapel Hill, NC (US);

Enn-Ling Chen, Chapel Hill, NC (US);

Raymond J. Kim, Chapel Hill, NC (US);

Assignees:

Siemens Medical Solutions USA, Inc., Malvern, PA (US);

Duke University, Durham, NC (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01V 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of suppressing artifacts arising from tissue, fluids, or other long-T1 species when acquiring magnetic resonance data with a segmented pulse sequence that assumes that magnetization is at steady state, said method including suppressing artifacts by producing an artifact suppression module (ASM) before the segmented sequence, the artifact suppression module comprising at least one selective, non-selective, or volume-selective suppression pulse and a time delay.


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