The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2013
Filed:
Dec. 02, 2011
Hantu Lin, Hsinchu, TW;
Chienhung Chen, Hsinchu, TW;
Hantu Lin, Hsinchu, TW;
Chienhung Chen, Hsinchu, TW;
AU Optronics Corp., Hsinchu, TW;
Abstract
A method for forming a conductor structure is provided. The method comprises: () providing a substrate; () forming a patterned dielectric layer with a first opening which exposes a portion of the substrate; forming a patterned organic material layer on the dielectric layer with a second opening which corresponds to the first opening and expose the exposed portion of the substrate; () forming a first barrier layer on the organic material layer and the exposed portion of the substrate; () forming a metal layer on the first barrier layer; and () removing the organic material layer, the first barrier layer thereon and the metal layer thereon.