The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 2013

Filed:

May. 28, 2010
Applicants:

Jun-bo Yoon, Daejeon, KR;

Byung-kee Lee, Daejeon, KR;

Dong-hoon Choi, Daejeon, KR;

Hyun-ho Yang, Daejeon, KR;

Inventors:

Jun-Bo Yoon, Daejeon, KR;

Byung-Kee Lee, Daejeon, KR;

Dong-Hoon Choi, Daejeon, KR;

Hyun-Ho Yang, Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/053 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed is a method for manufacturing 3-dimensional structure using a thin film with a columnar nano pores and a manufacture thereof. A method for packaging an MEMS device or an NEMS device in accordance with an embodiment of the present invention includes: forming a sacrificial layer; forming a thin film having columnar nano pores formed therein by depositing one of a metallic material, an oxide, a nitride and a fluoride on the sacrificial layer; forming a support layer on the thin film and patterning the support layer; removing the sacrificial layer through use of the nano pores of the thin film parts of which are exposed by patterning the support layer; and forming a shielding layer on the thin film and the support layer.


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