The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2013
Filed:
Jun. 05, 2009
Applicants:
Jong-jin Park, Yongin-si, KR;
Kwang-hee Lee, Suwon-si, KR;
Xavier Bulliard, Yongin-si, KR;
Yun-hyuk Choi, Seoul, KR;
Kwang-sup Lee, Daejeon, KR;
Inventors:
Jong-jin Park, Yongin-si, KR;
Kwang-hee Lee, Suwon-si, KR;
Xavier Bulliard, Yongin-si, KR;
Yun-hyuk Choi, Seoul, KR;
Kwang-sup Lee, Daejeon, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/004 (2006.01); G03F 7/40 (2006.01); G03F 7/027 (2006.01);
U.S. Cl.
CPC ...
Abstract
A composition for radical polymerization includes a photosensitive material, a photoinitiator, a solvent, and a material for adjusting a size of a pattern. A method of forming a pattern using the composition is also disclosed.
Park, Jong-jin. (2013). Composition for radical polymerization and method of forming pattern using the composition (U.S. Patent No. 8445178). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8445178
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile