The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 2013

Filed:

Aug. 22, 2008
Applicants:

Naohiko Era, Ibaraki, JP;

Hiroshi Kuwagaki, Ibaraki, JP;

Inventors:

Naohiko Era, Ibaraki, JP;

Hiroshi Kuwagaki, Ibaraki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C22C 9/06 (2006.01); C22F 1/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention provides Cu—Ni—Si—Co alloys having excellent strength, electrical conductivity, and press-punching properties. In one aspect, the invention is a copper alloy for electronic materials, containing 1.0 to 2.5 mass % of Ni, 0.5 to 2.5 mass % of Co, and 0.30 to 1.2 mass % of Si, the balance being Cu and unavoidable impurities, wherein the copper alloy for electronic material has a [Ni+Co+Si] content in which the median value ρ (mass %) satisfies the formula 20 (mass %)≦ρ≦60 (mass %), the standard deviation σ (Ni+Co+Si) satisfies the formula σ (Ni+Co+Si)≦30 (mass %), and the surface area ratio S (%) satisfies the formula 1%≦S≦10%, in relation to the compositional variation and the surface area ratio of second-phase particles size of 0.1 μm or greater and 1 μm or less when observed in a cross section parallel to a rolling direction.


Find Patent Forward Citations

Era, Naohiko. (2013). Cu—ni—si—co copper alloy for electronic materials and method for manufacturing same (U.S. Patent No. 8444779). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8444779

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…