The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8443460 B1

PDF
Full Text
Expired
Date of Patent:
May. 14, 2013

Filed:

Oct. 18, 2010
Applicants:

Johann Foucher, Voreppe, FR;

Pascal Faurie, Saint-Martin-le-Vinoux, FR;

Inventors:

Johann Foucher, Voreppe, FR;

Pascal Faurie, Saint-Martin-le-Vinoux, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01Q 40/00 (2010.01); G01Q 40/02 (2010.01);
U.S. Cl.
CPC ...
Abstract

A method for characterizing an atomic force microscopy tip using a characterization structure having two inclined sidewalls opposite one another and of which at least one actual lateral distance separating the two inclined sidewalls corresponding to a given height is known, the method including scanning the surfaces of the inclined sidewalls by the tip, the scanning being carried out while the tip oscillates solely vertically; measuring, for the given height, the lateral distance separating the two inclined sidewalls, the measurement incorporating the convolution of the shape of the tip with the shape of the characterization structure; and determining a characteristic dimension of the tip as a function of the measured lateral distance, and of the actual lateral distance.


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