The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 14, 2013

Filed:

Oct. 27, 2008
Applicants:

Sung-jin Park, Champaign, IL (US);

J. Gary Eden, Champaign, IL (US);

Paoyei Chen, McKinney, TX (US);

Paul A. Tchertchian, Mission Viejo, CA (US);

Thomas M. Spinka, Urbana, IL (US);

Inventors:

Sung-Jin Park, Champaign, IL (US);

J. Gary Eden, Champaign, IL (US);

Paoyei Chen, McKinney, TX (US);

Paul A. Tchertchian, Mission Viejo, CA (US);

Thomas M. Spinka, Urbana, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/091 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention provides microchannel lasers having a microplasma gain medium. Lasers of the invention can be formed in semiconductor materials, and can also be formed in polymer materials. In a microlaser of the invention, high density plasmas are produced in microchannels. The microplasma acts as a gain medium with the electrodes sustaining the plasma in the microchannel. Reflectors are used with the microchannel for obtaining optical feedback to obtain lasing in the microplasma gain medium in devices of the invention for a wide range of atomic and molecular species. Several atomic and molecular gain media will produce sufficiently high gain coefficients that reflectors (mirrors) are not necessary. Microlasers of the invention are based on microplasma generation in channels of various geometries. Preferred embodiment microlaser designs can be fabricated in semiconductor materials, such as Si wafers, by standard photolithographic techniques, or in polymers by replica molding.


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