The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2013
Filed:
May. 16, 2011
Thomas R. Albrecht, San Jose, CA (US);
Xiao Z. Wu, San Jose, CA (US);
Henry Hung Yang, San Jose, CA (US);
Thomas R. Albrecht, San Jose, CA (US);
Xiao Z. Wu, San Jose, CA (US);
Henry Hung Yang, San Jose, CA (US);
HGST Netherlands, B.V., Amsterdam, NL;
Abstract
Methods of defining servo patterns and data patterns for forming patterned magnetic media are described. For one method, a lithographic process is performed to define a servo pattern in servo regions on a substrate. The lithographic process also defines a first data pattern in data regions of the substrate. The first data pattern is then transferred to (i.e., etched into) the data regions. Self-assembly structures are then formed on the data pattern in the data regions to define a second data pattern. The servo pattern is then transferred to the servo regions and the second data pattern is transferred to the data regions. Thus, the servo pattern is defined through lithographic processes while the data pattern is defined by a combination of lithographic processes and self-assembly.