The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2013
Filed:
Sep. 26, 2008
Kailash Kiran Patalay, Santa Clara, CA (US);
Richard O. Collins, Santa Clara, CA (US);
Jean R. Vatus, San Jose, CA (US);
Zhepeng Cong, Vancouver, WA (US);
Kailash Kiran Patalay, Santa Clara, CA (US);
Richard O. Collins, Santa Clara, CA (US);
Jean R. Vatus, San Jose, CA (US);
Zhepeng Cong, Vancouver, WA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A substrate processing system includes an optical measurement assembly coupled to an exterior of a processing chamber that has a portion that is transparent. The processing chamber includes a reference object and a pedestal for supporting a work piece. The optical measurement assembly measures a lateral location, a height and a tilt of the pedestal by transmitting light into the processing chamber through the transparent portion of the processing chamber and detecting a reflected light from both the reference object and the portion of the pedestal after the reflected light leaves the chamber through the transparent portion of the processing chamber. A method of adjusting a pedestal includes analyzing the reflected light and leveling the pedestal, translating the pedestal, calibrating the pedestal height to a preheat ring level, and checking the level and location of the pedestal in response to the analyzed reflected light.