The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2013
Filed:
Aug. 19, 2011
Applicants:
Mikhail Sergeevich Chivilikhin, St. Petersburg, RU;
David R Heine, Horseheads, NY (US);
Ameya Joshi, Horseheads, NY (US);
Inventors:
Mikhail Sergeevich Chivilikhin, St. Petersburg, RU;
David R Heine, Horseheads, NY (US);
Ameya Joshi, Horseheads, NY (US);
Assignee:
Corning Incorporated, Corning, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/94 (2006.01); F01N 3/10 (2006.01); F01N 3/28 (2006.01);
U.S. Cl.
CPC ...
Abstract
An exhaust gas after-treatment system includes at least first and second substrates. The first substrate has a first region and a second region circumferentially surrounding the first region. The first region of the first substrate has a higher average cell density than the average cell density of the second substrate. The system can also include at least a third substrate.