The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2013
Filed:
Nov. 17, 2008
Applicants:
Francis Baillet, Paladru, FR;
Nicolas Gondrexon, Meylan, FR;
Inventors:
Francis Baillet, Paladru, FR;
Nicolas Gondrexon, Meylan, FR;
Assignees:
Institut Polytechnique de Grenoble, Grenoble Cedex, FR;
Universite Joseph Fourier, Saint Martin d'Heres, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); C03C 15/00 (2006.01); C03C 25/68 (2006.01); C23F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Method and device for selectively etching a first material () relative to a second material (), comprising a bath () of a solution capable of producing at least one chemical species for etching the first material () but not the second () and a system () for generating ultrasound at a frequency between 100 kHz and 3 MHz in the bath in order to produce cavitation bubbles.