The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2013
Filed:
Sep. 25, 2004
Matheen Siddiqui, Framingham, MA (US);
Jason Davis, Bellingham, MA (US);
Matheen Siddiqui, Framingham, MA (US);
Jason Davis, Bellingham, MA (US);
Cognex Technology and Investment Corporation, Mountain View, CA (US);
Abstract
Per one embodiment, a method is provided for refining a pose estimate of a model. The model is coarsely aligned with a run-time image, and it represents a 2D pattern. The pose estimate includes at least one pose estimate parameter. The model has a plurality of model features, and the run-time image has a plurality of run-time features. A given distance value is determined representing a given distance between a given one of the plurality of the model features mapped by a given pose estimate and a corresponding given run-time feature. A two-dimensional model description of the two-dimensional model pattern is provided. The two-dimensional model pattern is mapped using the given pose estimate to create a transformed version of the two-dimensional model pattern. The transformed version represents a non-linear movement of at least portions of the two-dimensional model pattern in a direction orthogonal to a plane of the two-dimensional model description.