The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2013
Filed:
Feb. 12, 2010
Aziz Alami-idrissi, Le Touvet, FR;
Sebastien Kerdiles, Saint Ismier, FR;
Walter Schwarzenbach, Saint Nzaire les Eymes, FR;
Aziz Alami-Idrissi, Le Touvet, FR;
Sebastien Kerdiles, Saint Ismier, FR;
Walter Schwarzenbach, Saint Nzaire les Eymes, FR;
S.O.I.TEC Silicon on Insulator Technologies, Bernin, FR;
Abstract
A method for reclaiming a surface of a substrate, wherein the surface, in particular a silicon surface, comprises a protruding residual topography, comprising at least the layer of a first material. By providing a filling material in the non-protruding areas of the surface of the substrate and the subsequent polishing, the reclaiming can be carried out such that the material consuming double-sided polishing step used in the prior art is no longer necessary.