The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2013

Filed:

Feb. 19, 2007
Applicants:

Taiji Nishi, Kurashiki, JP;

Go Tazaki, Tsukuba, JP;

Motohiro Fukuda, Tsukuba, JP;

Michio Yazawa, Sapporo, JP;

Masayuki Takahashi, Sapporo, JP;

Inventors:

Taiji Nishi, Kurashiki, JP;

Go Tazaki, Tsukuba, JP;

Motohiro Fukuda, Tsukuba, JP;

Michio Yazawa, Sapporo, JP;

Masayuki Takahashi, Sapporo, JP;

Assignee:

Kuraray Co., Ltd., Kurashiki-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12M 1/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

An object of the present invention is to provide a cell culture chamber with which the survival rate of cells to be cultured can be increased, and a method of producing the same. A cell culture chamber according to the present invention includes a mass of projections formed of a plurality of microprojections 1 formed on a surface on which cells are cultured. The width or diameter of each of the microprojections 1 is in a range of 20 nm to 3 μm, and the aspect ratio of each of the microprojections is in a range of 0.2 to 3.0. Thus, there can be provided a cell culture chamber most suitable for the adhesion and differentiation/proliferation of cells to be cultured.


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