The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2013
Filed:
Sep. 10, 2008
Bing Yen, Cupertino, CA (US);
Jim Hennessey, Campbell, CA (US);
Eric Freeman, Oakland, CA (US);
Kim Yang Lee, Fremont, CA (US);
David S. Kuo, Palo Alto, CA (US);
Mark Ostrowski, Lakeville, MN (US);
Bing Yen, Cupertino, CA (US);
Jim Hennessey, Campbell, CA (US);
Eric Freeman, Oakland, CA (US);
Kim Yang Lee, Fremont, CA (US);
David S. Kuo, Palo Alto, CA (US);
Mark Ostrowski, Lakeville, MN (US);
Seagate Technology LLC, Cupertino, CA (US);
Abstract
The invention relates to bit patterned recording media having a stop layer for chemical mechanical polishing. One embodiment of the present invention is a method of manufacturing a magnetic recording medium comprising the step of planarizing by chemical mechanical polishing until the stop layer is reached. The present invention also provides a magnetic recording medium having a stop layer.