The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2013
Filed:
Oct. 21, 2011
Koji Asakawa, Tokyo, JP;
Toshiro Hiraoka, Tokyo, JP;
Yoshihiro Akasaka, Tokyo, JP;
Yasuyuki Hotta, Tokyo, JP;
Koji Asakawa, Tokyo, JP;
Toshiro Hiraoka, Tokyo, JP;
Yoshihiro Akasaka, Tokyo, JP;
Yasuyuki Hotta, Tokyo, JP;
Kabushiki Kaisha Toshiba, Kawasaki-shi, JP;
Abstract
A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc-No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.