The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2013

Filed:

Nov. 24, 2009
Applicants:

Samuel Martin Stavis, North Potomac, MD (US);

Elizabeth Arlene Strychalski, North Potomac, MD (US);

Michael Gaitan, North Potomac, MD (US);

Inventors:

Samuel Martin Stavis, North Potomac, MD (US);

Elizabeth Arlene Strychalski, North Potomac, MD (US);

Michael Gaitan, North Potomac, MD (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); C23F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A nanofabrication process for use with a photoresist that is disposed on a substrate includes the steps of exposing the photoresist to a grayscale radiation pattern, developing the photoresist to remove a irradiated portions and form a patterned topography having a plurality of nanoscale critical dimensions, and selectively etching the photoresist and the substrate to transfer a corresponding topography having a plurality of nanoscale critical dimensions into the substrate.


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