The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 2013

Filed:

Oct. 23, 2009
Applicant:

Anton M. Deykoon, Arlington, MA (US);

Inventor:

Anton M. Deykoon, Arlington, MA (US);

Assignee:

Analogic Corporation, Peabody, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61B 6/03 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and system for generating a field of view extension of a CT scan and minimizing the effect of interfering objects is described. The system is configured and the method carries out the steps of generating a full sinogram based upon CT scan data of a scanned object and any interfering objects within the scanning field; determining the location of any interfering objects within the CT data based on physical and geometrical properties of the interfering objects; generating an ideal sinogram of any interfering objects based on their location and physical properties; subtracting the ideal sinogram from the full sinogram; extending a sinogram free of any interfering objects; and adding the ideal sinogram of interfering objects to the extended sinogram of the scanned object. Speeding up the computation of the extended sinogram by creating a look-up table of the tunable parameter of the extension function.


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