The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2013
Filed:
Sep. 05, 2008
Beom Soo Park, San Jose, CA (US);
Young Jin Choi, Santa Clara, CA (US);
Robin L. Tiner, Santa Cruz, CA (US);
Sam H. Kim, San Ramon, CA (US);
Soo Young Choi, Fremont, CA (US);
John M. White, Hayward, CA (US);
Dong-kil Yim, Seongnam-si, KR;
Beom Soo Park, San Jose, CA (US);
Young Jin Choi, Santa Clara, CA (US);
Robin L. Tiner, Santa Cruz, CA (US);
Sam H. Kim, San Ramon, CA (US);
Soo Young Choi, Fremont, CA (US);
John M. White, Hayward, CA (US);
Dong-Kil Yim, Seongnam-si, KR;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
The present invention generally comprises a method and an apparatus for guiding the flow of processing gases away from chamber walls and slit valve opening. By controlling the flow path of the process gases within a processing chamber, undesirable deposition upon chamber walls and within slit valve openings may be reduced. By reducing deposition in slit valve openings, flaking may be reduced. By reducing deposition on chamber walls, the time between chamber cleaning may be increased. Thus, guiding the flow of processing gases within the processing chamber may increase substrate throughput.